Today's printed electronic elements are formed by printing the active materials in the desired patterns, requiring that the active materials be formulated into a printable form. We explore an alternative approach to printed electronics where the patterning is achieved by printing, but the active material is deposited via atomic layer deposition (ALD). We thus separate the ink-like requirements from the active materials requirements. In this “patterned by printing” approach to printed electronics, a director material is printed that inhibits the deposition of the functional material. The active material is globally applied but only deposits in the areas where the director is not present—and as such is patterned at the time of deposition. In our work, the active materials are deposited by an atmospheric pressure, roll-compatible spatial ALD (SALD) process. Details on the director materials and printing techniques are discussed, and results from thin film transistors (TFTs) will be presented.