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Volume: 25 | Article ID: art00094_2
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Study of nib formation on a high-resolution thick film thermal head
  DOI :  10.2352/ISSN.2169-4451.2009.25.1.art00094_2  Published OnlineJanuary 2009
Abstract

For a dual-line 1200dpi thick film thermal printhead, the rendered dots are of elliptic shape, with aspect ratio of 1:1.5, due to the constraint of a smaller pitch in 1200dpi and the minimum nib line width required during nib line formation. This is one area for image quality improvement. Characteristics of conventional single-layer nib lines of different line width are studied. Based on the experimental result, a new formation approach of two-layer nib line structure is studied and tested to achieve the goal of producing an ideal round dot shape with aspect ratio of 1:1.

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Takeshi Toyosawa, JC Wang, Tatsuya Murakami, Masahito Shiraki, "Study of nib formation on a high-resolution thick film thermal headin Proc. IS&T Int'l Conf. on Digital Printing Technologies and Digital Fabrication (NIP25),  2009,  pp 755 - 758,  https://doi.org/10.2352/ISSN.2169-4451.2009.25.1.art00094_2

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