Prolonged exposure of a commercial organic photoconductor in the plasma environment corresponding to an industrial electrophotographic process caused formation of a parasitic surface layer with the properties different from the original photoconductor. The parasitic film consists of a heavily oxidized surface and oxygen-free subsurface layer with the chemical composition similar to the original photoconductor but a significantly different bonding arrangement. Formation of these two regions has been correlated with damage induced by the energetic radicals and the UV photons originating from the electrophotographic plasma discharge. In-depth understanding of the formation and the properties of this parasitic layer could provide effective means to overcome its detrimental impact on the printing cost and quality.