Back to articles
Volume: 19 | Article ID: art00089_1
Study of Thermal Print Head for High-Speed Print
  DOI :  10.2352/ISSN.2169-4451.2003.19.1.art00089_1  Published OnlineJanuary 2003

We studied a thermal print head featured high-speed print. In the former paper, we reported renovated head design and structure of a thin layer showing low thermal diffusivity formed on a substrate with high thermal diffusivity to attain 1200dpi high definition print. And we have developed such print head consisted of single crystal silicon substrate and sputtered film. We also conducted FEM analysis to the newly developed print head to evaluate the possibility of high speed print. As a result, we came to a conclusion that 40IPS (inch per second) using 300dpi head was technically achievable and print test using 600dpi head proved reliable print quality.

Subject Areas :
Views 6
Downloads 0
 articleview.views 6
 articleview.downloads 0
  Cite this article 

Hirotoshi Terao, Toshifumi Nakatani, "Study of Thermal Print Head for High-Speed Printin Proc. IS&T Int'l Conf. on Digital Printing Technologies (NIP19),  2003,  pp 375 - 378,

 Copy citation
  Copyright statement 
Copyright © Society for Imaging Science and Technology 2003
NIP & Digital Fabrication Conference
nip digi fabric conf
Society of Imaging Science and Technology
7003 Kilworth Lane, Springfield, VA 22151, USA