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Volume: 2 | Article ID: art00051
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Image Analysis Applied to Film Thickness Measurements with White Light Interferometry
Olov Marklund
Lennart Gustafsson
  DOI :  10.2352/CIC.1994.2.1.art00051  Published Online :  January 1994
Abstract

White light interferometry yields good resolution in thin film thickness measurements. Hue value variations vs. film thickness variations are complex and furthermore dependent on the power spectrum of the light source.Absolute film thickness measurements is possible using white light interferometry.

Journal Title : Color and Imaging Conference
Publisher Name : Society of Imaging Science and Technology
Publisher Location : 7003 Kilworth Lane, Springfield, VA 22151, USA
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 DOI 10.2352/CIC.1994.2.1.art00051
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Olov Marklund, Lennart Gustafsson, "Image Analysis Applied to Film Thickness Measurements with White Light Interferometry"  in Proc. IS&T 2nd Color and Imaging Conf.,  1994,  pp 186 - 189,  https://doi.org/10.2352/CIC.1994.2.1.art00051

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Copyright © Society for Imaging Science and Technology 1994
72010350
Color and Imaging Conference
color imaging conf
2166-9635
Society of Imaging Science and Technology
7003 Kilworth Lane, Springfield, VA 22151, USA
2166-9635(19940101)1994:1L.186;1-
cic_v1994n1/splitsection51.xml
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Articles
Image Analysis Applied to Film Thickness Measurements with White Light Interferometry
MarklundOlov
GustafssonLennart
01011994
1994
1
186
189
1994
White light interferometry yields good resolution in thin film thickness measurements. Hue value variations vs. film thickness variations are complex and furthermore dependent on the power spectrum of the light source.Absolute film thickness measurements is possible using white light interferometry.