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Volume: 29 | Article ID: art00055_2
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High-resolution Patterning Technologies using Ink-jet Printing and Laser Processing for Organic TFT Array
Koei Suzuki
Kazuaki Tsuji
Atsushi Onodera
Takeshi Shibuya
Takanori Tano
Hiroshi Miura
  DOI :  10.2352/ISSN.2169-4451.2013.29.1.art00055_2  Published Online :  January 2013
Abstract

A 150 ppi organic thin film transistor (OTFT) array, which TFT have pixel circuit with two transistors and one capacitor was fabricated by printing methods and laser processing. TFT array pitch was 169 μm, a minimum width of the source electrode was 15 μm, channel length was 5 μm, and a diameter of via hole was about 20 μm. We have developed the surface energy controlled ink-jet printing with UV irradiation for fine Ag electrodes and the conventional ink-jet printing for organic semiconductor (OSC), and laser processing for Via hole.

Journal Title : NIP & Digital Fabrication Conference
Publisher Name : Society of Imaging Science and Technology
Publisher Location : 7003 Kilworth Lane, Springfield, VA 22151, USA
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 DOI 10.2352/ISSN.2169-4451.2013.29.1.art00055_2
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Koei Suzuki, Kazuaki Tsuji, Atsushi Onodera, Takeshi Shibuya, Takanori Tano, Hiroshi Miura, "High-resolution Patterning Technologies using Ink-jet Printing and Laser Processing for Organic TFT Array"  in Proc. IS&T Int'l Conf. on Digital Printing Technologies and Digital Fabrication (NIP29),  2013,  pp 489 - 493,  https://doi.org/10.2352/ISSN.2169-4451.2013.29.1.art00055_2

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NIP & Digital Fabrication Conference
nip digi fabric conf
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Society of Imaging Science and Technology
7003 Kilworth Lane, Springfield, VA 22151, USA
2169-4451(20130101)2013:2L.489;1-
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Articles
High-resolution Patterning Technologies using Ink-jet Printing and Laser Processing for Organic TFT Array
SuzukiKoei
TsujiKazuaki
OnoderaAtsushi
ShibuyaTakeshi
TanoTakanori
MiuraHiroshi
01012013
2013
2
489
493
2013
A 150 ppi organic thin film transistor (OTFT) array, which TFT have pixel circuit with two transistors and one capacitor was fabricated by printing methods and laser processing. TFT array pitch was 169 μm, a minimum width of the source electrode was 15 μm, channel length was 5 μm, and a diameter of via hole was about 20 μm. We have developed the surface energy controlled ink-jet printing with UV irradiation for fine Ag electrodes and the conventional ink-jet printing for organic semiconductor (OSC), and laser processing for Via hole.