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Volume: 28 | Article ID: art00053_1
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New Submicron Silica Produced by the Fumed Process
  DOI :  10.2352/ISSN.2169-4451.2012.28.1.art00053_1  Published OnlineJanuary 2012
Abstract

Submicron silicas produced by fumed processes and their corresponding surface-modified counterparts are compared with respect to their applicability as external additives for electrophotographic toners. The principal metric for comparison is tribo-electrostatic charge (T-ESC) stability under extended activation periods. Experimental samples are surface-modified submicron silicas produced by a fumed process. These materials have sufficient hydrophobicity and can work as spacer particles to prevent the embedding of small particle size external additives. This spacer-attribute thereby eliminates problems with charge stability and flowability, especially under extreme environmental conditions, that can impact toner performance.

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Naohiro Naito, Yuki Amano, Yusuke Tosaki, Robert Johnson, Andreas Hille, "New Submicron Silica Produced by the Fumed Processin Proc. IS&T Int'l Conf. on Digital Printing Technologies and Digital Fabrication (NIP28),  2012,  pp 179 - 182,  https://doi.org/10.2352/ISSN.2169-4451.2012.28.1.art00053_1

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