Submicron silicas produced by fumed processes and their corresponding surface-modified counterparts are compared with respect to their applicability as external additives for electrophotographic toners. The principal metric for comparison is tribo-electrostatic charge (T-ESC) stability under extended activation periods. Experimental samples are surface-modified submicron silicas produced by a fumed process. These materials have sufficient hydrophobicity and can work as spacer particles to prevent the embedding of small particle size external additives. This spacer-attribute thereby eliminates problems with charge stability and flowability, especially under extreme environmental conditions, that can impact toner performance.
Naohiro Naito, Yuki Amano, Yusuke Tosaki, Robert Johnson, Andreas Hille, "New Submicron Silica Produced by the Fumed Process" in Proc. IS&T Int'l Conf. on Digital Printing Technologies and Digital Fabrication (NIP28), 2012, pp 179 - 182, https://doi.org/10.2352/ISSN.2169-4451.2012.28.1.art00053_1