Thermal ink jet (TIJ) deposition of lead zirconate titanate (PZT) thin films via a modified sol-gel was recently reported by our group [1-2]. Despite the strong piezoelectric performance, the use of PZT in microelectromechanical systems (MEMS) has thus far been limited due to the lack of process compatibility with existing MEMS manufacturing processes. Digital fabrication of PZT thin films eliminates the need for photolithographic patterning and etching, a major source of process incompatibility. Furthermore, direct printing of PZT films enables new device designs by allowing controlled deposition over non-planar topographies, and the fabrication of devices with varying thickness, neither of which can be accomplished with a conventional spin coating process. This paper reports conditions of deposition and crystallization for PZT thin films via thermal ink jet printing. Included are details of the solution chemistry developed, printing conditions required for MEMS quality films, and thermal processing parameters that enable a highly piezoelectric crystal structure.