Highly fluorescent anthracene polymers, linked by a alkylene unit, were examined for fluorescent patterning. The anthracene polymers were soluble in organic solvent such as chloroform, which allowed solution processing to afford fluorescent thin films using the spin coating method. The fluorescence intensity of the polymer solution as well as film was decreased upon exposure to a high energy UV source, due to the photodimerization of anthracene unit. Utilizing such fluorescence decay, a fluorescent polymer pattern was directly developed from the thin film using a photomask. The photo-patterning of the fluorescent anthracene polymer film afforded a convenient method of image formation and patterning of gap electrode.