An optical approach to nano-patterning using near field scanning optical microscopy (NSOM) is presented. Using an NSOM specifically designed for patterning 4 inch wafers, we have demonstrated sub-100 nm feature sizes in conventional i-line photoresists, optical patterning of a-Si:H based resists, and patterning over large distances without stitching errors. A series of test structures were also fabricated including quantum point contacts and micro crystallite arrays. Novel NSOM probes based on excitation of surface plasmon polaritons are also being explored. The higher throughput and lower damage threshold possible with this approach suggests a significant increase in write speed over conventional NSOM probes can be achieved.