Surface modification of carbon black with suitable anchor groups has been known to be best fit to the requirements of inkjet colorant.1 We found that surface modified carbon black can be successfully utilized as masking materials for many applications of semiconductor wafer processing. The present study attempts to achieve nano scale particles by attaching the electrolytic groups on the carbon black powder (average particle size 3 um) surface to form a pseudo products called as the “liquid” nano carbon. (LNC) having average particle size down to the range between 20-30nm detected by AFM (Atomic Force Microscopy) tip. As a result, the LNC product exhibits the thin film (400 Ao thick) forming properties without using vacuum techniques and micro patterning capability useful for microelectronic device fabrication.
Khe C. Nguyen, Le Van Thang, Doan Duc Chanh Tin, Tran Viet Toan, guyen Thuy Ai, Truong Thuy Le, Luu Tuan Anh, Dang Mau Chien, Vo Hong Nhan, "The Process of Forming Micropattern Image from “Liquid” Nano Carbon" in Proc. IS&T Digital Fabrication Conf., 2005, pp 209 - 212, https://doi.org/10.2352/ISSN.2169-4451.2005.21.2.art00066_3