We developed a new pulse DC plasma CVD layer deposition process for a-Si photoreceptor drums instead of the ordinary high frequency 13.56 MHz plasma process. This has made the layer deposition process speed 2 times faster, minimized by-product powder generation and improved the surface smoothness of the a-Si drum. Through these improvements, we realized production cost reduction. This makes it easier to offer small diameter a-Si drums for tandem color printers, where growth in demand is predicted.
Akihiko Ikeda, Takashi Nakamura, Masamitsu Sasahara, Daigorou Ookubo, Tetsuya Kawakami, "Development of a New a-Si Photoreceptor Drum by DC Plasma CVD" in Proc. IS&T Int'l Conf. on Digital Printing Technologies (NIP21), 2005, pp 13 - 16, https://doi.org/10.2352/ISSN.2169-4451.2005.21.1.art00007_1