Ink jet (IJ) printing has advanced to a point where etch resist imaging can be achieved at the required resolution for many segments of the photochemical machining (PCM) or chemical milling industry. This advance together with the development of suitable etch resist inks for this application has made it possible for the introduction of IJ printing in commercial PCM manufacturing environments. This paper describes attributes that affect the IJ printed resist resolution, novel inks suitable for jetting, the advantages that are gained and the resist performance obtained.