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Volume: 15 | Article ID: art00083_2
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The Structure-Photosensitivity Relationships of the Hydrazone-based Hole-transport Materials
  DOI :  10.2352/ISSN.2169-4451.1999.15.1.art00083_2  Published OnlineJanuary 1999
Abstract

The photosensitivities of a series of hydrazone-based hole-transport materials were correlated with their molecular structures. According to the electron density of the frontier orbital in the neutral molecule and cation radical of the charge transport material, the concept of the active hole-transport N atom was proposed. The relationships among photosensitivities, numbers of the active hole-transport N atom and the HOMO energy level of CTMs was investigated. The results showed that photosensitivity was strongly correlated to the numbers of the active hole-transport N atom and the HOMO energy level of CTMs. Therefore, it indicated that the hole injection process from CGL to CTL and hole transport process in CTL play significant role in photosensitivity.

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Zhongping Huang, Qingsen Yu, Jinhong Pan, Ruisen Lin, Hanxing Zong, "The Structure-Photosensitivity Relationships of the Hydrazone-based Hole-transport Materialsin Proc. IS&T Int'l Conf. on Digital Printing Technologies (NIP15),  1999,  pp 699 - 702,  https://doi.org/10.2352/ISSN.2169-4451.1999.15.1.art00083_2

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