Editor-in-Chief

Chunghui Kuo, Eastman Kodak Company

Associate Editors

Alessandro Artusi, University of Cyprus
Doo-Hyun Choi, Kyungpook National University
Frits Dijksman, University of Twente
Susan Farnand, Rochester Institute of Technology
Gabriele Gianini, Universita degli Studi di Milano
Yeong-Ho Ha, Kyungpook National University
Jon Yngve Hardeberg, Norwegian University of Science and Technology
Mathieu Hebert, Universite Jean Monnet de Saint Etienne
Rita Hofmann-Sievert, Bern University of Applied Sciences
Chih-Hsien Hsia, National Ilan University
Wen-Hsiang Hsieh, National Formosa University
Francisco Imai, Apple Inc.
Dileepan Joseph, University of Alberta
Hang-Bong Kang, Catholic University of Korea
David L. Kao, NASA Ames Research Center
Jihoon Kim, Kongju National University
Yong-Hoon Kim, Sungkyunkwan University
Kye-Si Kwon, Soonchunhyang University
Oh-Seol Kwon, Changwon National University
Chaker Larabi, University of Poitiers
Branka Lozo, University of Zagreb
Teruaki Mitsuya, Ricoh Company, Ltd.
Henry Y.T. Ngan, ENPS
Marius Pedersen, Norwegian University of Science and Technology
Jia-Shing Sheu, National Taipei University of Education
Steven Simske, Colorado State University
Chang-Hwan Son, Kunsan National University
Masato Tsukada, NEC Corporation
Norimichi Tsumura, Chiba University
Danli Wang, Chinese Academy of Sciences
Yi Wang, Manhattan College
Thomas Wischgoll, Wright State University
Yaohua Xie, Chinese Academy of Sciences
Shujian Yu, University of Florida
Zeev Zalevsky, Bar-Ilan University
Song Zhang, Mississippi State University