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Volume: 41 | Article ID: art00006
The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators
DOI : 10.2352/J.ImagingSci.Technol.1997.41.1.art00006 Published Online : January 1997
Abstract
An overview on the utility of 2-nitrobenzyl sulfonate photoacid generators (PAG) in chemically amplified deep UV (248 nm) photoresists is presented. This article will detail how structural changes in photoacid generators affect properties such as quantum yield, thermal stability, etc., and will also illustrate how these properties influence the lithographic characteristics of photoresist formulations.
Journal Title : Journal of Imaging Science and Technology
Publisher Name : Society of Imaging Science and Technology
Publisher Location : 7003 Kilworth Lane, Springfield, VA 22151, USA
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F. M. Houlihan, O. Nalamasu, J. M. Kometani, E. Reichmanis, "The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators" in Journal of Imaging Science and Technology, 1997, pp 35 - 40, https://doi.org/10.2352/J.ImagingSci.Technol.1997.41.1.art00006
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Copyright © Society for Imaging Science and Technology 1997