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Volume: 41 | Article ID: art00006
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The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generators
  DOI :  10.2352/J.ImagingSci.Technol.1997.41.1.art00006  Published OnlineJanuary 1997
Abstract

An overview on the utility of 2-nitrobenzyl sulfonate photoacid generators (PAG) in chemically amplified deep UV (248 nm) photoresists is presented. This article will detail how structural changes in photoacid generators affect properties such as quantum yield, thermal stability, etc., and will also illustrate how these properties influence the lithographic characteristics of photoresist formulations.

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F. M. Houlihan, O. Nalamasu, J. M. Kometani, E. Reichmanis, "The Retrospective on 2-Nitrobenzyl Sulfonate Photoacid Generatorsin Journal of Imaging Science and Technology,  1997,  pp 35 - 40,  https://doi.org/10.2352/J.ImagingSci.Technol.1997.41.1.art00006

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Copyright © Society for Imaging Science and Technology 1997
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