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Volume: 40 | Article ID: art00014
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Hole Removal in High-pH-Induced Reduction-Sensitized Silver Bromide Grains
  DOI :  10.2352/J.ImagingSci.Technol.1996.40.6.art00014  Published OnlineNovember 1996
Abstract

High-pH-induced reduction sensitization was used to form silver clusters on the surfaces of octahedral silver bromide grains. This method had the advantage of not leaving unreacted reducing agent in the emulsion, which could cause further silver cluster formation over time. Diffuse reflection spectroscopy measurements showed these silver clusters to be similar to those formed by dimethylamine borane and SnCl2, except that the absorption peaks were noticeably less intense. Large emulsion grains sensitized in this manner benefited most from the hole-removal ability of the silver clusters. The result was a linear relationship between speed and grain volume for edge lengths 0.28 to 1.22 mm, with a slope of 0.93 +/− 0.08, which is close to the theoretical slope of 1.0. Core-shell emulsions in which the cores were oversensitized with sulfur also benefited from the high-pH-induced reduction sensitization on the surface. Instead of desensitization of the core when oversensitized, these emulsions showed dramatically increased internal sensitivity, consistent with the proposed hole-removal property of the surface silver clusters. No evidence of electron trapping by these chemically produced silver clusters could be found.

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A. Gary DiFrancesco, Monica Tyne, Chris Pryor, Richard Hailstone, "Hole Removal in High-pH-Induced Reduction-Sensitized Silver Bromide Grainsin Journal of Imaging Science and Technology,  1996,  pp 576 - 581,  https://doi.org/10.2352/J.ImagingSci.Technol.1996.40.6.art00014

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