An industrial scale ink-jet and light induced plating (LIP) based front side metallization process for crystalline silicon solar cells is presented. Via Schmid ink-jet printer “NanoJet” a < 1μm thin seed layer is printed that opens the isolating SiNx antireflective layer and creates a metal contact from cell surface to cell by burn-in in a high temperature furnace. Via LIP, a highly conductive silver layer is grown on the printed areas.Following this strategy, fine finger lines with a width of 30-35μm after printing and 50-55μm after plating on mono- and poly-crystalline silicon cells were deposited. This lead to a 20% reduction of silver consumption and a gain of 0.3%_abs of cell efficiency compared to standard screen printing process.