The solar photovoltaic industry is driven towards increasing cell efficiency while reducing cost. Ink jet process offers an attractive, non-contact method enabling reduced capital equipment cost, fewer process steps and higher throughput. This study focuses on inkjet processes development of directly etching through a Silicon Nitride layer (anti-reflection layer), selectively doping and precisely dispensing a seed layer, also their combination at a shot to prepare for conventional screen printing afterwards or for low cost electroplating for the “selectiveemitter” solar cell fabrication.