We propose for the first time that a hybrid digital fabrication method can be applied to generate micro patterns with highly accuracy of thickness and width. It is simply coupled with inkjet printing and photolithography and mainly aimed to solve several issues of uneven films that are usually found in inkjet printing. First, the draft pattern of film can be fabricated onto a substrate by micro-fluidic deposition method. In other words, inkjet printing basically forms the pre-determined pattern by fluidic droplet deposition. The droplet fluids must belong to material of photo resist. Secondly, pre-baking is applied to dry the solvent of fluidic pattern. In the third step, the draft pattern is further modified with accurate one in desire by the photo mask of lithography. Finally, after stripping process, the micro pattern is successfully generated as desire with high accuracy of morphology. If the photo resist is colored with green/red/blue, we demonstrate the method can be applied to the manufacturing of LCD color filter; moreover, many applications of printed devices in the future can be found in this promising hybrid method.