
There has been increasing demand for digital printing using dry electrophotography especially to adapt high-resistance media such as transparent film or waterproof paper made from synthetic resin. In dry electrophotography, charging through the second transfer process causes electrostatic adhesion between each media for their high resistance, which lead to poor storage quality and electric shocks to operators. These prevent post-processing and limit the number of storable sheets. We have developed an elimination technology which improve these issues by utilizing the advantages of both a contact and a non-contact static elimination of static electricity. The contact static elimination is highly responsive to speed by supplying charge in narrow gap, and the non-contact is capable of uniform elimination of static electricity by supplying charge through corona discharge. This technology is installed as a paper output option for products of Fujifilm, Revoria Press PC1120, EC2100S/EC2100, SC285S/SC285. As a result of introducing the technology to the market, it was found that it is necessary to accommodate static elimination for various types of media. When evaluating media resistance for each region's media using the charge decay half-life as an indicator, no regional differences were observed among Western countries, Asia, and Japan. For representative high-resistance media such as films, hologram films, label paper, and water-resistant paper, it was found that static elimination is required when the surface resistivity exceeds a certain value. This technology improves the work of printers with high resistance materials such as film and waterproof paper, reduces the need for the previous work of peeling off stuck paper, avoids operators from large amounts of static electricity. So, this technology enables digital printing using dry electrophotography to handle a variety of media, enabling printing companies to add value and expand the market.
Koichiro Yuasa, Yutaka Kiuchi, "Contact and Non-contact Hybrid Static Elimination Technology to Adapt High Resistance Media in Electrophotography" in IS&T International Conference on Special Topics , 2025, pp 4 - 8, https://doi.org/10.2352/APT.2025.1.1.3