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Proceedings Paper
Volume: 2 | Article ID: 9
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Atmospheric Digital Plasma Array for One-step Surface Metallization
  DOI :  10.2352/AIT.2026.1.1.9  Published OnlineJanuary 2026
Abstract
Abstract

A two-dimensional microplasma array operating under atmospheric conditions has been developed and optimized for direct surface metallization. Unlike conventional plasma arrays where all cells ignite simultaneously, this system enables independent ignition and quenching of individual plasma cells “on demand,” a unique feature protected by a granted patent. The plasma head integrates ink injection capillaries and an aerosol generator, enabling one-step deposition of metallic layers, with silver selected as a representative material for decoration and functional coatings. The project focused on improving plasma head stability, deposition resolution, and sustainability through enhanced electronics, optimized gas flow, and advanced manufacturing methods such as laser cutting, 3D ceramic printing, and plasma copper deposition. Results demonstrate stable operation up to 30 minutes, improved plume length (1.5 mm at 2 slm), and reproducible ignition during ink injection without clogging. Surface metallization was achieved in one step, though further optimization is required to eliminate ink residues and leakage. This technology offers scalable, high-resolution solutions for functional printing, selective coatings, and advanced manufacturing.

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David Martinet, Christoph Ellert, Jian-Lin Huang, Grégoire Magnin, Gilbert Gugler, "Atmospheric Digital Plasma Array for One-step Surface Metallizationin Advanced Inkjet Technology,  2026,  pp 40 - 45,  https://doi.org/10.2352/AIT.2026.1.1.9

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This work is licensed under the Creative Commons Attribution 4.0 International License. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
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